TZO Target

TZO Target


Product introduction

With plasma as the heat source, high purity and high density TZO target is produced from respective powders, which are heated to molten or semi-molten state and deposited on the surface of backing tube at high speeds to form dense coatings.


Applications

AR film ofoptical glasses

Low-E glasses

Tool and decorative coatings


Product features

The uniformity of film formation was ≤3%

The sputtering power is about 12.5kW/m

The sputtering rate is 1.8-2 times higher than that of zinc tin


Specifications

Chemical composition(wt%)ZnO:SnO2 52±2:48±2
Purity(%)≥99.9
Density(g/cm³)≥5.4
ImpuritiesAl≤200 Si≤200 In≤200 Fe≤30
Total impurity≤1000
Electrical resistivity(Ω·cm)
≤0.5


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